Параметри
Photoelectric and deep level study of metamorphic InAs/InGaAs quantum dots with GaAs confining barriers for photoluminescence enhancement
Тип публікації :
Стаття
Дата випуску :
11 серпня 2020 р.
Автор(и) :
Golovynskyi, Sergii
Institute of Semiconductor Physics, Shenzhen University, Taras Shavchenko Kyiv National University, Taras Shevchenko National University of Kyiv
Datsenko, Oleksandr
Seravalli, Luca
CNR-IMEM Institute, Universita degli Studi di Parma Dipartimento di Fisica e Scienze della Terra Macedonio Melloni, University of Dublin Trinity College
Trevisi, Giovanna
Institute of Materials for Electronics and Magnetism
Frigeri, Paola
National Research Council - Italy, CNR - IMEM, Universita degli Studi di Parma Dipartimento di Fisica e Scienze della Terra Macedonio Melloni
Li, Baikui
Hong Kong University of Science and Technology, Shenzhen University, University of Science and Technology of China
Qu, Junle
Мова основного тексту :
English
eKNUTSHIR URL :
Журнал :
Semiconductor Science and Technology
Том :
35
Випуск :
9
ISSN :
0268-1242
Початкова сторінка :
095022
Цитування :
Golovynskyi, S., Datsenko, O. I., Seravalli, L., Kondratenko, S. V., Trevisi, G., Frigeri, P., Li, B., & Qu, J. (2020). Photoelectric and deep level study of metamorphic InAs/InGaAs quantum dots with GaAs confining barriers for photoluminescence enhancement. Semiconductor Science and Technology, 35(9), 095022. https://doi.org/10.1088/1361-6641/ab9db4
Metamorphic InAs/InGaAs quantum dots (QDs) have been proposed as active elements for optoelectronic light-emitting devices operating in the infrared range. However, advanced structure design to allow efficient and stable enhancement of quantum yield at room temperature are still needed. Here, we compare a metamorphic InAs/In0.15Ga0.85As QD heterostructure with and without GaAs confining barriers, to investigate the effect of introducing GaAs barriers on the photo- and thermo-electrical properties. GaAs confining barriers allow to enhance the QD photoluminescence intensity at 1.3 μm, i.e. second telecommunication window, by more than two orders of magnitude at room temperature and at 80 K. We also discuss the effect of GaAs barriers on the carrier transport and on defect-related levels detected by means of photocurrent and deep level thermally stimulated current spectroscopies. GaAs confining barriers decrease the thermal escape rate of electrons confined in QD and wetting layer, thereby highly increasing the radiative recombination and also quenching the photocurrent. At low temperatures, the barriers also reduce the capture of electrons generated in InGaAs by the QD layer and, on the other hand, prevent the trapping of electrons outside the QD layer, decreasing carrier lifetimes. The deep levels identified as point and extended defects have been detected in the InGaAs layers. There are no new types of defects introduced in the structure by the addition of the barriers, but this causes a weakly increased density of traps near QDs. Our results show that InAs/InGaAs QDs with GaAs confining barriers can be efficient light emitters with only a slight increase of defects in the structure. Hence, such advanced design for metamorphic QDs can be of relevant interest for applications in energy-efficient QD lasers, optical amplifiers and single-photon emitters operating at 1.3–1.55 μm.
Галузі знань та спеціальності :
104 Фізика та астрономія
Галузі науки і техніки (FOS) :
Оптика
Фізика конденсованих систем
Тип зібрання :
Publication
Файл(и) :
Ескіз недоступний
Формат
Adobe PDF
Розмір :
2.96 MB
Контрольна сума:
(MD5):1acfbd9e93ed05807927c6b36b1a9863
Ця робота розповсюджується на умовах ліцензії Creative Commons CC BY-NC-SA
10.1088/1361-6641/ab9db4